Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production

Applied Materials Today

Nouseen, S.; Ghosh, K.; Pumera, M., 2024: Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production. APPLIED MATERIALS TODAY 36, doi: 10.1016/j.apmt.2023.101995; FULL TEXT
(RIGAKU3, VERIOS, LYRA, KRATOS-XPS, JASCO)

Equipment:

X-ray powder diffractometer Rigaku SmartLab 3kW
High resolution Scanning Electron Microscope FEI Verios 460L
Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3
X-ray Photoelectron Spectroscopy Axis Supra
UV/Vis/NIR Spectrophotometer Jasco V-770

Research Groups:

Future Energy and Innovation
CF: CEITEC Nano

CEITEC authors:

Shaista Nouseen
Dr. Kalyan Ghosh
Prof. Martin Pumera, Ph.D.